Porous silicon formation device (anodization device)
A porous silicon formation device that further applies conventional anodic oxidation equipment. Porous silicon wafers are formed depending on the chemical solution used and the current density.
The anodizing device was traditionally a device that flowed current to form an oxide film, but the further developed porous silicon formation device is one that forms porous silicon by changing the chemical solution used and the current density. *For more details, please download the PDF (catalog) or feel free to contact us.*
- Company：ダルトン
- Price：Other
